Atomic layer deposition of yttria-stabilized zirconia thin films for enhanced reactivity and stability of solid oxide fu

Joonho Park, Yeageun Lee, Ikwhang Chang, Gu Young Cho, Sanghoon Ji, Wonyoung Le, Suk Won Cha


We report the advantages of atomic layer deposition (ALD) for the fabrication of yttria-stabilized zirconia (YSZ) electrolyte. The reactivity and stability of anodic aluminum oxide (AAO)-based thin-film solid oxide fuel cells (SOFCs) are improved by applying ALD YSZ electrolyte. The fuel cell fabricated by ALD shows a peak power density of 154.6 mW cm-2 at 450 ℃, whereas the fuel cell fabricated by sputtering demonstrates a peak power density of 66.2 mW cm-2. The amorphous and nanogranular microstructure of the ALD YSZ film is ascribed for a significant improvement in the cathodic reactivity of the AAO-based thin-film fuel cells. Moreover, the smooth and uniform surface of the ALD YSZ electrolytes mitigates the agglomeration of the Pt cathode layer, and thus the thermal stability of the thin-film fuel cell is remarkably improved at 450 ℃.